关键词: 矮壮素, 乙烯利, 多效唑, 燕麦, 抗倒伏, 产量

Abstract:

Lodging is one of the major factors affecting oat yield. To investigate the effects of different plant growth regulators and their concentrations on lodging resistance and yield of oat, the cultivar Tongyan No. 3 was used as the test material. Before the jointing stage, foliar sprays of different concentrations of chlormequat chloride (0.80×10³, 1.25×10³, 2.00×10³, 4.00×10³, and 6.00×10³ mg/kg), ethephon (250, 400, 500, 650, and 900 mg/kg), and paclobutrazol (150, 200, 250, 300, and 400 mg/kg) were applied, with an equal volume of water as the control (CK), to explore the regulatory effects of different concentrations of chemical regulation treatments on lodging resistance and yield of oat plants. The results showed that all three regulators reduced plant height to varying degrees. Spraying chlormequat chloride had little effect on the diameter and bending strength of the second basal internode, but significantly reduced plant height and enhanced lodging resistance at concentrations of 4.00×10³-6.00×10³ mg/kg. Spraying ethephon at 650-900 mg/kg could enhance bending strength and increase grain number per panicle, thereby significantly increasing oat yield. Spraying paclobutrazol at 200-250 mg/kg significantly reduced plant height, increased the diameter of the second basal internode, enhanced stem bending strength, and increased grain number per panicle, thereby significantly improving both lodging resistance and yield, with effects superior to those of chlormequat chloride and ethephon. Comprehensive analysis indicated that chlormequat chloride at 4.00×10³ mg/kg significantly improved lodging resistance, ethephon at 650 mg/kg significantly increased yield, and paclobutrazol at 200 mg/kg significantly enhanced both lodging resistance and yield, showing the best overall effect.

Key words: Chlormequat chloride, Ethephon, Paclobutrazol, Oat, Lodging resistance, Yield